Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

The hydrogen content of plasma-deposited silicon nitride

W. A. Lanford, Myron J. Rand · Journal of Applied Physics · 1978 · 782 citations

Natural Sciences, Chemistry, Materials Science +17

Comparison of properties of dielectric films deposited by various methods

W. A. Pliskin · Journal of Vacuum Science and Technology · 1977 · 484 citations

Natural Sciences, Materials Engineering, Materials Science +17

Low-temperature deposition of high-quality silicon dioxide by plasma-enhanced chemical vapor deposition

J. Batey, E. Tierney · Journal of Applied Physics · 1986 · 328 citations

Natural Sciences, Materials Engineering, Materials Science +17

Neutral <i>E</i>′ centers in microwave downstream plasma-enhanced chemical-vapor-deposited silicon dioxide

W. L. Warren, Patrick M. Lenahan, B. Robinson et al. · Applied Physics Letters · 1988 · 56 citations

Engineering, Materials Engineering, Materials Science +17

Plasma deposition of inorganic silicon containing films

Alan R. Reinberg · Journal of Electronic Materials · 1979 · 52 citations

Natural Sciences, Materials Engineering, Materials Science +14