Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films - Concepedia

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Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

29

Citations

14

References

1990

Year

S. Nguyen, D. Dobuzinsky, D. Döpp, R. T. Gleason, M. Gibson, S. A. Fridmann

Thin Solid Films

Materials ScienceHigh Quality SiliconEngineeringSurface ScienceApplied PhysicsThin FilmsChemical Vapor DepositionPlasma EtchingPlasma ProcessingThin Film Processing

References

	Year	Citations

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