Publication | Closed Access
Investigation of the<i>DX</i>center in heavily doped<i>n</i>-GaAs
148
Citations
14
References
1987
Year
SemiconductorsIi-vi SemiconductorElectrical EngineeringEngineeringPhysicsNanoelectronicsApplied PhysicsQuantum MaterialsCondensed Matter PhysicsFree-electron DensitySemiconductor MaterialDx CenterOptoelectronicsCompound SemiconductorDx Level
Shubnikov--de Haas and persistent-photoconductivity measurements are used to study the mobility, the free-electron density (n), and the occupancy of the DX center in heavily doped n-GaAs [Si,Sn] as a function of doping level and hydrostatic pressure. The results show that the DX center produces a resonant donor level between the \ensuremath{\Gamma} and L conduction-band minima at a concentration comparable with the doping level. For the Si-doped samples, comparison with local vibration-mode measurements indicates that the DX level can be identified with ${\mathrm{Si}}_{\mathrm{Ga}}$.
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