Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography

Abstract

Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. Fiber Bragg gratings with more than 99.9% reflectivity are photoimprinted using the phase masks and near perfect spectral response is obtained in spite of stitching errors.