Concepedia

Preparation of boron nitride thin films by microwave plasma enhanced CVD, for semiconductor applications

O. Baehr, Philippe Thévenin, A. Bath, A. Koukab, Etienne Losson, B. Lepley

Materials Science and Engineering B · 1997 · 14 citations · 14 references

DOI

Concepts

References

14

Properties and applications of surface wave produced plasmas

Michel Moisan, C. M. Ferreira, Y. Hajlaoui et al. · Revue de Physique Appliquée · 1982 · 192 citations · Full text

, , +14

InP/SiO2 MIS structure

L. Messick · Journal of Applied Physics · 1976 · 70 citations

, , +15

Plasma enhanced chemical vapor deposition and characterization of boron nitride gate insulators on InP

A. Bath, P. J. van der Put, J. Schoonman et al. · Journal of Applied Physics · 1991 · 65 citations · Full text

, , +15

Microwave plasma: its characteristics and applications in thin film technology

J. Musil · Vacuum · 1986 · 62 citations

, , +14

Plasma‐Assisted Chemical Vapor Deposition and Characterization of Boron Nitride Films

S. V. Nguyen, Tùng Lâm Nguyễn, H. Treichel et al. · Journal of The Electrochemical Society · 1994 · 53 citations

, , +17