Publication | Closed Access
SiGe BiCMOS Technology with 3.0 ps Gate Delay
24
Citations
5
References
2007
Year
Unknown Venue
Electrical EngineeringEngineeringVlsi DesignEmitter AreaHigh-frequency DeviceNanoelectronicsElectronic EngineeringC HbtsApplied PhysicsSige Bicmos TechnologyComputer EngineeringRf SemiconductorIntegrated CircuitsMicroelectronicsQuantum EngineeringNm Bicmos Technology
This work reports on a 130 nm BiCMOS technology with high-speed SiGe:C HBTs featuring a transit frequency of 255 GHz and a maximum oscillation frequency of 315 GHz at an emitter area of 0.17 x 0.53 mum <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> . A minimum gate delay of 3.0 ps was achieved for CML ring oscillators. Breakdown voltages of the HBTs are measured to be BV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">CEO</sub> =1.8 V, BV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">CBO</sub> =5.6 V, andBV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">EBO</sub> =1.9 V.
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