Concepedia

Advances in remote plasma-enhanced chemical vapor deposition for low temperature In situ hydrogen plasma clean and Si and Si1-xGex epitaxy

Tsan‐sheng Hsu, B. Anthony, Ruizhe Qian, J. Irby, D. Kinosky, A. Mahajan, Sanjay K. Banerjee, C. W. Magee, A.F. Tasch

Journal of Electronic Materials · 1992 · 14 citations · 15 references

DOI

Concepts

References

15

Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

Yves J. Chabal, G. S. Higashi, K. Raghavachari et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 662 citations

, , +17

Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition

B.S. Meyerson · Applied Physics Letters · 1986 · 496 citations

Cooperative growth phenomena in silicon/germanium low-temperature epitaxy

B.S. Meyerson, Kevin J. Uram, F. K. LeGoues · Applied Physics Letters · 1988 · 341 citations

, , +14

Silicon molecular beam epitaxy

Yusuke Ota · Thin Solid Films · 1983 · 298 citations

, , +1

Nonequilibrium boron doping effects in low-temperature epitaxial silicon films

B.S. Meyerson, F. K. LeGoues, T.N. Nguyen et al. · Applied Physics Letters · 1987 · 172 citations

, , +13