Concepedia

Publication | Closed Access

Advances in remote plasma-enhanced chemical vapor deposition for low temperature In situ hydrogen plasma clean and Si and Si1-xGex epitaxy

DOI

14

Citations

15

References

1992

Year

Tsan‐sheng Hsu, B. Anthony, Ruizhe Qian, J. Irby, D. Kinosky, A. Mahajan, Sanjay K. Banerjee, C. W. Magee, A.F. Tasch
Journal of Electronic Materials

References

YearCitations

Page 1