Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases

Optical constants of rf sputtered hydrogenated amorphous Si

E. C. Freeman, William Paul · Physical review. B, Condensed matter · 1979 · 333 citations

Natural Sciences, Materials Science, Physics +17

Optical characterization of HfO2 thin films grown by atomic layer deposition

Jaan Aarik, Hugo Mändar, M. Kirm et al. · Thin Solid Films · 2004 · 194 citations

Natural Sciences, Materials Science, Physics +16

Refractive index of thin films of SiO_2, ZrO_2, and HfO_2 as a function of the films’ mass density

Martin Jerman, Zhaohui Qiao, Dieter Mergel · Applied Optics · 2005 · 147 citations

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A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

Roland Thielsch, Andrea Gatto, Joerg Heber et al. · Thin Solid Films · 2002 · 140 citations

Natural Sciences, Materials Engineering, Materials Science +16

Structure, optical properties and thermal stability of pulsed sputter deposited high temperature HfOx/Mo/HfO2 solar selective absorbers

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Natural Sciences, Materials Engineering, Materials Science +16