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A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

Materials ScienceMaterials EngineeringHfo2 Single LayersOptical MaterialsEngineeringOptical PropertiesSurface ScienceApplied PhysicsComparative StudyReactive EvaporationChemical DepositionChemical Vapor DepositionOptoelectronicsPlasma ProcessingThin Film Processing