Applied Physics Letters · 1994 · 56 citations · 6 references
Natural SciencesChemistryMaterials ScienceBiosensorsSurface ChemistrySurface ScienceElectron Beam LithographyNanostructured SurfacesSurface CoatingsSurface Functionalization Of NanomaterialsSurface ModificationSurface PhysicsDevice FabricationFocused Ion Beam PatterningMaskless LithographyMonolayer FilmsMonolayersSecondary Ion Mass SpectrometrySelf-assembled Monolayer PatterningSelf-assembled Monolayers
Decanethiol [CH3(CH2)9SH] self-assembled monolayer films on silver substrates have been irradiated in selected areas by focused ion or electron bombardment. Subsequent immersion of the irradiated sample in a solution of a fluoromercaptan [CF3(CF2)2(CH2)2SH] results in attachment of this molecule to the silver surface in the ion or electron-exposed regions, producing a micrometer spatial-scale pattern of two chemically distinct alkanethiol monolayers. The coverage of the fluoromercaptan on the bombarded areas was found to reach maximum levels of 70% at ion doses of 6×1013 ions/cm2 and 50% at electron doses of 2×1017 electrons/cm2 as determined by secondary ion mass spectrometry. These methods of maskless patterning may be useful for semiconductor or biosensor device fabrication.
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Self-assembled monolayer electron beam resist on GaAs
R. C. Tiberio, H. G. Craighead, Michael J. Lercel et al. · Applied Physics Letters · 1993 · 134 citations