Plasma etching of submicron devices: in situ monitoring and control by multi-wavelength ellipsometry - Concepedia

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Plasma etching of submicron devices: in situ monitoring and control by multi-wavelength ellipsometry

32

Citations

7

References

1998

Year

Helen Maynard, N. Layadi, J.T.C. Lee

Thin Solid Films

EngineeringElectron-beam LithographyPhysicsMicrofabricationBeam LithographyApplied PhysicsSubmicron DevicesInstrumentationMulti-wavelength EllipsometryMicroelectronicsPlasma EtchingOptoelectronicsPlasma ProcessingNanolithography Method

References

	Year	Citations

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