N. Layadi

Substrate selectivity in the formation of microcrystalline silicon: Mechanisms and technological consequences

P. Roca i Cabarrocas, N. Layadi, T. Heitz et al. · Applied Physics Letters · 1995 · 156 citations

Substrate Selectivity, Miniaturization, Engineering +19

Real-time spectroscopic ellipsometry study of the growth of amorphous and microcrystalline silicon thin films prepared by alternating silicon deposition and hydrogen plasma treatment

N. Layadi, Pere Roca i Cabarrocas, B. Drévillon et al. · Physical review. B, Condensed matter · 1995 · 137 citations

Engineering, Silicon Deposition, Silicon On Insulator +16

Cl 2 plasma etching of Si(100): Nature of the chlorinated surface layer studied by angle-resolved x-ray photoelectron spectroscopy

N. Layadi, Vincent M. Donnelly, J. T. C. Lee · Journal of Applied Physics · 1997 · 83 citations

Engineering, Chemistry, Silicon On Insulator +16

Plasma deposition of microcrystalline silicon: the selective etching model

I. Solomon, B. Drévillon, Hajime Shirai et al. · Journal of Non-Crystalline Solids · 1993 · 63 citations

Engineering, Microfabrication, Applied Physics +4

Role of mobile hydrogen in the amorphous silicon recrystallization

C. Godet, N. Layadi, Pere Roca i Cabarrocas · Applied Physics Letters · 1995 · 59 citations

Engineering, Dense Nanocrystalline Silicon, Silicon On Insulator +16