Journal of Applied Physics · 2001 · 10 citations · 15 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsElectronic MaterialsSemiconductor MaterialsEpitaxial GrowthQuantum DotsSemiconductor Crystal GrowthSemiconductor DefectsSemiconductor NanomaterialsSemiconductor PhysicsAtomically Thin SemiconductorsChannelingCoverageDeformationMolecular Beam EpitaxySemiconductor NanostructuresSemiconductor Quantum DotsStrain Effects
InAs quantum dots (QDs) on GaAs(100) grown by molecular-beam epitaxy were structurally characterized by ion channeling. Lattice deformation of the InAs QDs and diffusion of Ga atoms into InAs QDs were clearly observed to depend strongly on the InAs coverage. It was revealed that the diffusion is significantly enhanced when the InAs coverage is changed from 1.53 to 1.71 monolayer. During this change, lattice deformation was reduced while the average size (base diameter) of dots was decreased. These phenomena suggest that some growth process change occurred.
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Self-organized growth of regular nanometer-scale InAs dots on GaAs
J. M. Moison, F. Houzay, F. Barthe et al. · Applied Physics Letters · 1994 · 928 citations