Behaviour of TiAlN coatings for tools applied in the thermoplastic moulding of inorganic glasses

Handbook of Thin Film Technology

L. I. Maissel, R. Glang, Paul P. Budenstein · Journal of The Electrochemical Society · 1971 · 2.8K citations

Natural Sciences, Materials Engineering, Materials Science +12

The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sources

John A. Thornton, David W. Hoffman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 154 citations

Natural Sciences, Materials Science, Physics +17

Stress dependence of reactively sputtered aluminum nitride thin films on sputtering parameters

G. L. Huffman, D. E. Fahnline, R. Messier et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 84 citations

Natural Sciences, Materials Engineering, Materials Science +15

Internal stresses in amorphous silicon films depositied by cylindrical magnetron sputtering using Ne, Ar, Kr, Xe, and Ar+H2

John A. Thornton, David W. Hoffman · Journal of Vacuum Science and Technology · 1981 · 75 citations

Natural Sciences, Materials Engineering, Materials Science +17

Stress and property control in sputtered metal films without substrate bias

David W. Hoffman · Thin Solid Films · 1983 · 73 citations

Natural Sciences, Materials Engineering, Materials Science +16