Japanese Journal of Applied Physics · 1985 · 17 citations · 5 references
Natural SciencesMaterials EngineeringMaterials ScienceOptical MaterialsSemiconductor MaterialsThin FilmsAmorphous Electronic MaterialsAmorphous MaterialsAmorphous SemiconductorsOptical Properties Of SemiconductorsOptoelectronic MaterialsSemiconductor PhysicsAmorphous CarbonAmorphous Semiconductor FilmsAmorphous SiliconBand GapElectronic Band GapOptical Band GapSilicon CarbideSilicon Carbide (Sic) Materials
A new type of amorphous silicon-carbide film is produced by the glow discharge decomposition of an intermediate species SiF 2 , CF 4 and H 2 gas mixture. Optical band gap and photoconductive properties of this film are measured as a function of carbon content. It is found that the optical band gap can be increased up to 2.2 eV by increasing carbon content without apparent degradation of film properties such as photoconductivity and photosensitivity.
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Boron Doping of Hydrogenated Silicon Thin Films
Akihisa Matsuda, Mitsuo Matsumura, Satoshi Yamasaki et al. · Japanese Journal of Applied Physics · 1981 · 82 citations
Tandem type amorphous solar cells
G. Nakamura, Kazuhiko Sato, Takashi Ishihara et al. · Journal of Non-Crystalline Solids · 1983 · 31 citations