Applied Physics Letters · 1998 · 111 citations · 15 references
EngineeringDense GeSilicon On InsulatorNanoelectronicsSiliceneMolecular Beam EpitaxyEpitaxial GrowthNanolithography MethodSurface ReconstructionMaterials SciencePhysicsNanotechnologyTwo-dimensional OrderingSemiconductor Device FabricationMicroelectronicsVicinal SiMicrofabricationRegular RipplesSurface ScienceApplied PhysicsSurface Analysis
Two-dimensional ordering is achieved in a single layer of self-assembled Ge islands fabricated by molecular beam epitaxy on vicinal Si(001) surfaces with regular ripples caused by step bunching. The ripples with a typical period of about 120 nm lead to the long-range lineup of the Ge islands along their directions, while the strong repulsive interaction between the dense Ge islands determines their relative arrangement on different step bunches of a ripple. The ordering pattern can be tuned by the Ge coverage and the direction of the ripples. The ordering also helps to improve the size homogeneity of the Ge islands.
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