Concepedia

Application of Chemical-Mechanical Polishing to Planarization of Surface-Micromachined Devices

R.D. Nasby, J.J. Sniegowski, James H. Smith, Stephen Montague, C.C. Barron, William P. Eaton, Dale L. Hetherington, Christopher A. Apblett, J. G. Fleming, P. J. McWhorter

1996 · 57 citations · 13 references

Open access

Abstract

We discuss the CMP process and present examples of the use of CMP in fabricating MEMS devices such as microengines, pressure sensors, and proof masses for accelerometers along with its use for monolithically integrating MEMS devices with microelectronics.

References

13

Chemical processes in glass polishing

Lee M. Cook · Journal of Non-Crystalline Solids · 1990 · 989 citations

Natural Sciences, Chemistry, Materials Science +11

Laterally Driven Polysilicon Resonant Microstructures

William C. Tang, Tu-Cuong H. Nguyen, Roger T. Howe · Sensors and Actuators · 1989 · 737 citations

Engineering, Materials Engineering, Materials Science +6

Laterally driven polysilicon resonant microstructures

William C. Tang, T.-C.H. Nguyen, Roger T. Howe · 2003 · 382 citations

Engineering, Materials Engineering, Materials Science +6

Application of Chemical Mechanical Polishing to the Fabrication of VLSI Circuit Interconnections

W. Patrick, W. L. Guthrie, C. L. Standley et al. · Journal of The Electrochemical Society · 1991 · 237 citations

Engineering, Electrical Engineering, Materials Science +17

Polycrystalline Silicon Micromechanical Beams

Roger T. Howe, R.S. Muller · Journal of The Electrochemical Society · 1983 · 192 citations

Engineering, Materials Science, Mechanical Engineering +17