Applied Physics Letters · 2007 · 13 citations · 16 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsMaterials PhysicsSolid State PhysicsAmorphous Electronic MaterialsAmorphous MaterialsAmorphous SemiconductorsAmorphous SolidsSemiconductor Crystal GrowthWide Band Gap SemiconductorsBand GapElectronic Structure Of Amorphous MaterialsFermi LevelFermi SurfaceSputter DepositionValence BandValence Band StructureValence Electron Structure
We report the experimental evidence of significant change of the valence band structure during crystallization of Ge2Sb2Te5 (GST). Amorphous GST, prepared by sputter deposition at room temperature (RT), transforms successively into face-centered-cubic (fcc) and a hexagonal-close-packed (hcp) structures at around 150 and 300°C, respectively, during a stepwise temperature increase from RT to 350°C. During temperature increase, ultraviolet photoemission spectra were in vacuo obtained using synchrotron radiation. The measurement of the amorphous and fcc GST shows that the difference between the maximum valence band edge and the Fermi level reduces by 0.35eV during crystallization. For the fcc to hcp phase transformation, no band gap reduction was observed.
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Model for the Electronic Structure of Amorphous Semiconductors
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