Applied Physics Letters · 1999 · 184 citations · 29 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMaterials CharacterizationSemiconductor MaterialsAlloysIii-v SemiconductorsSemiconductor Crystal GrowthWide Band Gap SemiconductorsWide-bandgap SemiconductorsBand GapCompositionComposition BEpitaxial Film GrowthEpitaxial Growth Of Wide-bandgap SemiconductorsGallium Nitride (Gan) MaterialsWide-bandgap Materials Growth
The band gap of AlxGa1−xN is measured for the composition range 0⩽x<0.45; the resulting bowing parameter, b=+0.69 eV, is compared to 20 previous works. A correlation is found between the measured band gaps and the methods used for epitaxial growth of the AlxGa1−xN: directly nucleated or buffered growths of AlxGa1−xN initiated on sapphire at temperatures T>800 °C usually lead to stronger apparent bowing (b>+1.3 eV); while growths initiated using low-temperature buffers on sapphire, followed by high-temperature growth, lead to weaker bowing (b<+1.3 eV). Extant data suggest that the intrinsic band-gap bowing parameter for AlGaN alloys is b=+0.62(±0.45) eV.
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Optical constants of epitaxial AlGaN films and their temperature dependence
Daniel Brunner, H. Angerer, E. Bustarret et al. · Journal of Applied Physics · 1997 · 601 citations
Epitaxially grown AlN and its optical band gap
Woosoon Yim, E. J. Stofko, P. J. Zanzucchi et al. · Journal of Applied Physics · 1973 · 600 citations
Natural Sciences, Materials Engineering, Materials Science +17
Optical Properties of the Silver and Cuprous Halides
M. Cardona · Physical Review · 1963 · 583 citations