Fabrication of Pb(Zr, Ti)O₃ Microscopic Capacitors by Electron Beam Lithography

Abstract

An epitaxial microscopic capacitor array of Pb(Zr, Ti)O 3 /SrRuO 3 with 0.5-to 2-µ m squares was fabricated by electron-beam lithography and Ar-ion etching on a SrTiO 3 (001) substrate. Atomic force microscopic observation revealed that line-and-spacing larger than 1 µ m assures adequate separation between capacitors. A thin barrier is formed on the terrace edge of the capacitors due to re-deposition of Ar-ion etched oxide.