Successful Enhancement of Lifetime for SiO<tex>$_2$</tex>on 4H-SiC by N<tex>$_2$</tex>O Anneal

Abstract

Time-dependent dielectric breakdown (TDDB) measurement by constant current stress has been performed to investigate the oxide (SiO/sub 2/) reliability grown on n-type 4H-SiC. At 300K, the intrinsic injected charge to breakdown (Q/sub BD/) of thermally grown SiO/sub 2/ in wet O/sub 2/ ambience is about 0.1 C/cm/sup 2/, whereas N/sub 2/O anneal after the thermal oxidation results in the drastic improvement of the reliability. The intrinsic Q/sub BD/ of N/sub 2/O annealed SiO/sub 2/ is found to be 10 C/cm/sup 2/, which is two orders of magnitude larger than that of the oxide without N/sub 2/O anneal, suggesting that the quality of SiO/sub 2/ and/or SiO/sub 2//SiC interface is improved. TDDB measurement has been also performed at high temperatures up to 423 K. The activation energy of oxide lifetime estimated from time to failure of 80% is 0.35 and 0.10 eV for the oxide with and without N/sub 2/O anneal, respectively.