Spatial Atomic Layer Deposition is a variant of atomic layer deposition in which precursor gases are spatially separated within the reactor, enabling continuous substrate processing through physical movement rather than temporal pulsing of reactants.
107
Publications
5.8K
Citations
399
Authors
150
Institutions
Publications per year
2017–2026
53
Variants
S-aldSpatial Ald
Parents
Publications
107
Paul Poodt, David Cameron, Eric Dickey et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 381 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +13
1–5 of 107
Authors
399
- PP
19
h-index
- FR
18
h-index
- DMDavid Muñoz‐Rojas
Centre National de la Recherche Scientifique, France
12 publications · 623 citations
12
h-index
- AI
12
h-index
- SL
9
h-index
1–5 of 399
Institutions
150
Eindhoven University of Technology
Eindhoven, The Netherlands
18 h-index
27 publications
1.8K citations
Holst Centre (Netherlands)
Eindhoven, Netherlands
13 h-index
64 publications
2.6K citations
Institut polytechnique de Grenoble
Grenoble, France
11 h-index
60 publications
2.6K citations
Centre National de la Recherche Scientifique
Paris, France
10 h-index
63 publications
2.2K citations
Dayeh University
Dacun, Taiwan
9 h-index
19 publications
470 citations
Université Grenoble Alpes
Saint-Martin-d'Hères, France
9 h-index
53 publications
1.8K citations
Xiamen University of Technology
Xiamen, China
8 h-index
48 publications
1.1K citations
Huazhong University of Science and Technology
Wuhan, China
7 h-index
40 publications
926 citations
1–8 of 150
Venues
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
25 publications · 1.3K citations
22
h-index
- International Journal of Heat and Mass Transfer
5 publications · 130 citations
5
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- ACS Applied Materials & Interfaces
4 publications · 284 citations
4
h-index
- Thin Solid Films
4 publications · 119 citations
4
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- Chemical Engineering Science
4 publications · 92 citations
4
h-index
1–5