Concepedia

Oxide Sacrificial Layers

Oxide Sacrificial Layers is a thin film material, typically composed of silicon dioxide or similar dielectric compounds, selectively deposited and subsequently removed during microfabrication processes to enable the release or patterning of overlying structural layers in MEMS and nanodevices.

108

Publications

4.8K

Citations

582

Authors

178

Institutions

Publications per year

2017–2026

27

Parents

Publications

108

Synthesis of freestanding single-crystal perovskite films and heterostructures by etching of sacrificial water-soluble layers

Di Lu, David J. Baek, Seung Sae Hong et al. · Nature Materials · 2016 · 644 citations · Full text

, , +14

A monolithic three-axis micro-g micromachined silicon capacitive accelerometer

Junseok Chae, Haluk Külah, K. Najafi · Journal of Microelectromechanical Systems · 2005 · 187 citations · Full text

, , +17

High aspect-ratio combined poly and single-crystal silicon (HARPSS) MEMS technology

Farrokh Ayazi, K. Najafi · Journal of Microelectromechanical Systems · 2000 · 169 citations

, , +17

Fabrication and characterization of surface micromachined capacitive ultrasonic immersion transducers

Xuecheng Jin, I. Ladabaum, F. Levent Degertekin et al. · Journal of Microelectromechanical Systems · 1999 · 169 citations

, , +16

Efficient sacrificial-agent-free solar H2O2 production over all-inorganic S-scheme composites

Miaoli Gu, Yi Yang, Liuyang Zhang et al. · Applied Catalysis B: Environmental · 2022 · 155 citations

, , +13

1–5 of 108

Authors

582

  1. KN
    K. Najafi

    University of Michigan, United States

    5 publications · 515 citations

    5

    h-index

  2. CD
    Ching‐Liang Dai

    National Chung Hsing University, Taiwan

    4 publications · 82 citations

    4

    h-index

  3. HY
    Harold Y. Hwang

    Stanford University, United States

    4 publications · 793 citations

    4

    h-index

  4. HK
    Haluk Külah

    Middle East Technical University, Türkiye

    4 publications · 346 citations

    4

    h-index

  5. YH
    Yasuyuki Hikita

    Stanford University, United States

    4 publications · 793 citations

    4

    h-index

1–5 of 582

Institutions

178

  1. Stanford University

    Stanford, United States

    6 h-index

    31 publications

    3.2K citations

  2. National Chung Hsing University

    Taichung, Taiwan

    5 h-index

    17 publications

    325 citations

  3. University of Michigan

    Ann Arbor, United States

    5 h-index

    14 publications

    1.4K citations

  4. University of California, Berkeley

    Berkeley, United States

    5 h-index

    18 publications

    1.5K citations

  5. Chinese Academy of Sciences

    Beijing, China

    4 h-index

    25 publications

    1.2K citations

  6. University of Chinese Academy of Sciences

    Beijing, China

    4 h-index

    9 publications

    316 citations

  7. SLAC National Accelerator Laboratory

    Menlo Park, United States

    4 h-index

    17 publications

    3.2K citations

  8. Institut de Ciència de Materials de Barcelona

    Cerdanyola del Vallès, Spain

    3 h-index

    15 publications

    460 citations

1–8 of 178

Venues

  1. Journal of Microelectromechanical Systems

    9 publications · 774 citations

    9

    h-index

  2. Applied Physics Letters

    4 publications · 178 citations

    4

    h-index

  3. Sensors

    4 publications · 82 citations

    4

    h-index

  4. Sensors and Actuators A Physical

    4 publications · 128 citations

    4

    h-index

  5. Thin Solid Films

    5 publications · 73 citations

    4

    h-index

1–5