High-aspect-ratio Coating

High-Aspect-Ratio Coating is a thin film deposition process in which conformal nanoscale layers are uniformly applied within deep, narrow features characterized by a significantly greater depth-to-width ratio, enabling precise surface engineering in high-aspect-ratio micro- and nanostructures.

61

Publications

2.9K

Citations

293

Authors

114

Institutions

Publications per year

2017–2026

14

Authors

293

  1. NP
    Neil P. Dasgupta

    University of Michigan, United States

    2 publications · 126 citations

    2

    h-index

  2. RG
    Roy G. Gordon

    Harvard University, United States

    2 publications · 466 citations

    2

    h-index

  3. JV
    Joan Vila‐Comamala

    Paul Scherrer Institute, Switzerland

    2 publications · 82 citations

    2

    h-index

  4. VA
    Vitaliy A. Guzenko

    Paul Scherrer Institute, Switzerland

    2 publications · 82 citations

    2

    h-index

  5. MR
    Mikko Ritala

    University of Helsinki, Finland

    2 publications · 119 citations

    2

    h-index

1–5 of 293

Venues

  1. Microelectronic Engineering

    4 publications · 83 citations

    4

    h-index

  2. Thin Solid Films

    3 publications · 62 citations

    3

    h-index

  3. Chemistry of Materials

    3 publications · 80 citations

    3

    h-index

  4. Journal of Applied Physics

    3 publications · 103 citations

    3

    h-index

  5. Journal of Micromechanics and Microengineering

    JMM · 2 publications · 170 citations

    2

    h-index

1–5