Etching-based Pattern Transfer
Etching-Based Pattern Transfer is a thin-film patterning technique that belongs to the class of pattern transfer methods, distinguished by its use of selective material removal through chemical or physical etching processes to replicate a predefined mask pattern onto an underlying thin film with high spatial fidelity.
38
Publications
1.1K
Citations
202
Authors
54
Institutions
Publications per year
2017–2026
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Parents
38
A universal etching-free transfer of MoS2 films for applications in photodetectors
Donglin Ma, Jianping Shi, Qingqing Ji et al. · Nano Research · 2015 · 111 citations
1–5 of 38
202
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Commissariat à l'Énergie Atomique et aux Énergies Alternatives, France
1 publications · 21 citations
1
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National Centre of Scientific Research "Demokritos", Greece
1 publications · 56 citations
1
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1–5 of 202
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Massachusetts Institute of Technology
Cambridge, United States
2 h-index
10 publications
276 citations
National Centre of Scientific Research "Demokritos"
Athens, Greece
2 h-index
8 publications
352 citations
Sandia National Laboratories California
Livermore, United States
1 h-index
3 publications
90 citations
Vavilov Institute of General Genetics
Moscow, Russia
1 h-index
3 publications
84 citations
University of Science and Technology of China
Hefei, China
1 h-index
5 publications
190 citations
Laboratoire d'Électronique des Technologies de l'Information
Grenoble, France
1 h-index
8 publications
168 citations
CeNTech
Münster, Germany
1 h-index
1 publications
49 citations

UNSW Sydney
Sydney, Australia
1 h-index
2 publications
76 citations
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4 publications · 94 citations
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4 publications · 59 citations
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3 publications · 86 citations
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3 publications · 129 citations
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JMM · 3 publications · 45 citations
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