Etch-Induced Defects is a phenomenon in semiconductor manufacturing that refers to structural imperfections or anomalies in thin films caused directly by the physical or chemical processes employed during etching, distinguishing it from defects originating from materials, deposition, or external contamination.
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Etching Mechanism of Monoatomic Aluminum Layers during MXene Synthesis
Yong-Jae Kim, Seon Joon Kim, Darae Seo et al. · Chemistry of Materials · 2021 · 277 citations
Natural Sciences, Materials Engineering, Materials Science +16
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Centre National de la Recherche Scientifique
Paris, France
10 h-index
45 publications
1.9K citations
Chinese Academy of Sciences
Beijing, China
10 h-index
49 publications
938 citations
University of Florida
Gainesville, United States
10 h-index
43 publications
1.4K citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
9 h-index
27 publications
613 citations
Sandia National Laboratories
Albuquerque, United States
9 h-index
38 publications
1.3K citations
Institute of High Pressure Physics
Warsaw, Poland
9 h-index
21 publications
1K citations
Radboud University Nijmegen
Nijmegen, The Netherlands
9 h-index
14 publications
713 citations
Polish Academy of Sciences
Warsaw, Poland
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25 publications
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- Journal of Applied Physics
44 publications · 1.8K citations
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JES · 43 publications · 2.4K citations
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- Applied Physics Letters
27 publications · 1.5K citations
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- Journal of Crystal Growth
36 publications · 1.2K citations
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- Japanese Journal of Applied Physics
JJAP · 37 publications · 1.3K citations
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