Concepedia

Etch Mask Design

Etch Mask Design is a methodological framework in microfabrication that specifies the geometric and material configuration of protective layers used to selectively shield underlying substrates during bulk micromachining etching processes, thereby defining the resultant microstructural topology.

100

Publications

3.5K

Citations

504

Authors

143

Institutions

Publications per year

2017–2026

14

Parents

Publications

100

Micropolarizer array for infrared imaging polarimetry

Gregory P. Nordin, Jeffrey T. Meier, Panfilo C. Deguzman et al. · Journal of the Optical Society of America A · 1999 · 257 citations

, , +17

A new masking technology for deep glass etching and its microfluidic application

Minqiang Bu, Tracy Melvin, G J Ensell et al. · Sensors and Actuators A Physical · 2004 · 168 citations

, , +15

Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars

Michael David Henry, Sameer S. Walavalkar, Andrew Homyk et al. · Nanotechnology · 2009 · 125 citations

, , +16

UV-LIGA process for high aspect ratio structure using stress barrier and C-shaped etch hole

Hyun-Kee Chang, Yong-Kweon Kim · Sensors and Actuators A Physical · 2000 · 104 citations

, , +12

Sacrificial etching of III - V compounds for micromechanical devices

Klas Hjort · Journal of Micromechanics and Microengineering · 1996 · 102 citations

, , +16

1–5 of 100

Authors

504

  1. ME
    Masayoshi Esashi

    Tohoku University, Japan

    3 publications · 36 citations

    3

    h-index

  2. ST
    Shuji Tanaka

    Tohoku University, Japan

    2 publications · 22 citations

    2

    h-index

  3. NW
    Nicolle Wilke

    Cardiff University, United Kingdom

    2 publications · 94 citations

    2

    h-index

  4. SL
    Seungmoo Lee

    Samsung (South Korea), South Korea

    2 publications · 58 citations

    2

    h-index

  5. GC
    G.J. Campisi

    United States Naval Research Laboratory, United States

    1 publications · 14 citations

    1

    h-index

1–5 of 504

Institutions

143

  1. Chinese Academy of Sciences

    Beijing, China

    5 h-index

    31 publications

    722 citations

  2. Delft University of Technology

    Delft, The Netherlands

    3 h-index

    8 publications

    228 citations

  3. Tohoku University

    Sendai, Japan

    3 h-index

    14 publications

    175 citations

  4. Samsung (South Korea)

    Seoul, South Korea

    3 h-index

    12 publications

    338 citations

  5. McMaster University

    Hamilton, Canada

    2 h-index

    4 publications

    137 citations

  6. Texas Instruments (United States)

    Dallas, United States

    2 h-index

    4 publications

    77 citations

  7. University of Alabama in Huntsville

    Huntsville, United States

    2 h-index

    3 publications

    528 citations

  8. University of Chinese Academy of Sciences

    Beijing, China

    2 h-index

    9 publications

    142 citations

1–8 of 143

Venues

  1. 7

    h-index

  2. Applied Physics Letters

    7 publications · 299 citations

    7

    h-index

  3. Microelectronic Engineering

    7 publications · 176 citations

    7

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 7 publications · 325 citations

    7

    h-index

  5. Nanotechnology

    5 publications · 236 citations

    5

    h-index

1–5