Concepedia

Device Isolation

Device Isolation is a fabrication technique in integrated circuit manufacturing that belongs to the class of processes designed to electrically separate adjacent semiconductor devices, distinguished by its implementation of physical or insulating structures to prevent unwanted current leakage and crosstalk between neighboring components on a chip.

232

Publications

7.7K

Citations

978

Authors

238

Institutions

Publications per year

2017–2026

21

Parents

Publications

232

Evaluating effectiveness and optimum design of isolation devices for highway bridges using the fragility function method

Jian Zhang, Yili Huo · Engineering Structures · 2009 · 418 citations

, , +16

Bridging the gap between software and hardware techniques for I/O virtualization

José Renato Santos, Yoshio Turner, Ganesh Janakiraman et al. · USENIX Annual Technical Conference · 2008 · 211 citations

, , +14

An overview of high-temperature electronic device technologies and potential applications

P. L. Dreike, Daniel M. Fleetwood, Donald B. King et al. · IEEE Transactions on Components Packaging and Manufacturing Technology Part A · 1994 · 184 citations

, , +17

Survivor: An enhanced controller placement strategy for improving SDN survivability

Lucas Fernando Müller, Rodrigo R. Oliveira, Marcelo Caggiani Luizelli et al. · 2014 · 184 citations

, , +16

Isolation of junction devices in GaAs using proton bombardment

A.G. Foyt, W.T. Lindley, C. M. Wolfe et al. · Solid-State Electronics · 1969 · 175 citations

, , +14

1–5 of 232

Authors

978

  1. NE
    Nobuhiro Endo

    NEC (Japan), Japan

    4 publications · 100 citations

    4

    h-index

  2. KJ
    K.A. Jenkins

    IBM Research - Thomas J. Watson Research Center, United States

    4 publications · 113 citations

    4

    h-index

  3. JS
    J.K.O. Sin

    Hong Kong University of Science and Technology, Hong Kong SAR China

    4 publications · 97 citations

    4

    h-index

  4. YK
    Yukinori Kurogi

    NEC (Japan), Japan

    4 publications · 100 citations

    4

    h-index

  5. AI
    Akihiko Ishitani

    NEC (Japan), Japan

    4 publications · 100 citations

    4

    h-index

1–5 of 978

Institutions

238

  1. Texas Instruments (United States)

    Dallas, United States

    10 h-index

    49 publications

    1.3K citations

  2. Hewlett-Packard (United States)

    Palo Alto, United States

    9 h-index

    22 publications

    1.3K citations

  3. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    9 h-index

    40 publications

    1.5K citations

  4. AT&T (United States)

    Bedminster, United States

    8 h-index

    33 publications

    735 citations

  5. Toshiba (Japan)

    Tokyo, Japan

    7 h-index

    28 publications

    1.2K citations

  6. Hong Kong University of Science and Technology

    Hong Kong, Hong Kong

    6 h-index

    19 publications

    551 citations

  7. NEC (Japan)

    Tokyo, Japan

    5 h-index

    26 publications

    669 citations

  8. Centre National de la Recherche Scientifique

    Paris, France

    5 h-index

    13 publications

    543 citations

1–8 of 238

Venues

  1. IEEE Transactions on Electron Devices

    27 publications · 803 citations

    18

    h-index

  2. Journal of The Electrochemical Society

    JES · 10 publications · 301 citations

    10

    h-index

  3. Applied Physics Letters

    9 publications · 321 citations

    9

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 8 publications · 153 citations

    8

    h-index

  5. IEEE Electron Device Letters

    8 publications · 231 citations

    8

    h-index

1–5