Concepedia

Contact Reliability

Contact Reliability is the ability of a metal-semiconductor junction to maintain its intended electrical and physical performance over time under specified operating conditions, distinguishing it from broader semiconductor reliability by focusing specifically on the stability and degradation mechanisms of the interface between metallic interconnects and semiconductor materials.

336

Publications

11.2K

Citations

1.3K

Authors

317

Institutions

Publications per year

2017–2026

36

Parents

Publications

336

Electromigration failure modes in aluminum metallization for semiconductor devices

J. R. Black · Proceedings of the IEEE · 1969 · 675 citations

, , +16

Design and Operation of Stable rf-Biased Superconducting Point-Contact Quantum Devices, and a Note on the Properties of Perfectly Clean Metal Contacts

J. E. Zimmerman, Paul Thiene, John T. Harding · Journal of Applied Physics · 1970 · 395 citations

, , +14

Junction growth in metallic friction: the role of combined stresses and surface contamination

David Tabor · Proceedings of the Royal Society of London A Mathematical and Physical Sciences · 1959 · 327 citations

, , +16

A survey of ohmic contacts to III-V compound semiconductors

Albert G. Baca, F. Ren, J.C. Zolper et al. · Thin Solid Films · 1997 · 236 citations · Full text

, , +14

Survey of Contact Fretting in Electrical Connectors

M. Antler · IEEE Transactions on Components Hybrids and Manufacturing Technology · 1985 · 233 citations

, , +17

1–5 of 336

Authors

1.3K

  1. MA
    M. Antler

    Ross Laboratories (United States), United States

    5 publications · 364 citations

    5

    h-index

  2. JM
    J.W. McBride

    University of Southampton, United Kingdom

    5 publications · 113 citations

    5

    h-index

  3. MP
    Michael Pecht

    University of Maryland, College Park, United States

    5 publications · 74 citations

    5

    h-index

  4. SD
    S. Demuynck

    IMEC, Belgium

    4 publications · 127 citations

    4

    h-index

  5. ZT
    Zsolt Tökei

    IMEC, Belgium

    3 publications · 56 citations

    3

    h-index

1–5 of 1.3K

Institutions

317

  1. IMEC

    Leuven, Belgium

    10 h-index

    89 publications

    2.3K citations

  2. IBM (United States)

    Armonk, United States

    10 h-index

    38 publications

    830 citations

  3. Hitachi (Japan)

    Tokyo, Japan

    6 h-index

    23 publications

    755 citations

  4. Centre National de la Recherche Scientifique

    Paris, France

    6 h-index

    13 publications

    215 citations

  5. University of Southampton

    Southampton, United Kingdom

    6 h-index

    18 publications

    408 citations

  6. University of California, Los Angeles

    Los Angeles, United States

    6 h-index

    15 publications

    1K citations

  7. KU Leuven

    Leuven, Belgium

    6 h-index

    10 publications

    269 citations

  8. Korea Advanced Institute of Science and Technology

    Daejeon, South Korea

    6 h-index

    26 publications

    736 citations

1–8 of 317

Venues

  1. Microelectronics Reliability

    26 publications · 927 citations

    16

    h-index

  2. 15

    h-index

  3. Journal of Applied Physics

    17 publications · 1.1K citations

    15

    h-index

  4. Journal of Electronic Materials

    JEM · 11 publications · 311 citations

    10

    h-index

  5. Thin Solid Films

    9 publications · 394 citations

    9

    h-index

1–5