M.-T. Tang

Rapid thermal oxidation of silicon in N2O between 800 and 1200 °C: Incorporated nitrogen and interfacial roughness

M. L. Green, D. Brasen, K. Evans‐Lutterodt et al. · Applied Physics Letters · 1994 · 135 citations

Materials Science, Oxide Heterostructures, Chemical Engineering +13

Angle Calculations for a `2+2' Surface X-ray Diffractometer

K. Evans‐Lutterodt, M.-T. Tang · Journal of Applied Crystallography · 1995 · 66 citations

Angle Calculations, Engineering, Surface Diffractometer +16

Regulating Au coverage for the direct oxidation of methane to methanol

Yueshan Xu, Daoxiong Wu, Qinghua Zhang et al. · Nature Communications · 2024 · 61 citations · Full text

X-Ray Resonance in Crystal Cavities: Realization of Fabry-Perot Resonator for Hard X Rays

Shih‐Lin Chang, Yu. P. Stetsko, M.-T. Tang et al. · Physical Review Letters · 2005 · 44 citations · Full text

X-ray Spectroscopy, Engineering, Microscopy +20

Si/SiO 2 interface roughness: Comparison between surface second harmonic generation and x-ray scattering

Steven T. Cundiff, Wayne H. Knox, F.H. Baumann et al. · Applied Physics Letters · 1997 · 39 citations

Engineering, Silicon On Insulator, /Sio2 Interface +18