Patrick J. Paniez

Thermostable trilayer resist for niobium lift-off

Pascal Dubos, P. Charlat, Th. Crozes et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 36 citations · Full text

Materials Science, Materials Engineering, Superconducting Material +15

Resist processes for hybrid (electron-beam/deep ultraviolet) lithography

S. Tedesco, Thierry Mourier, B. Dal’zotto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 30 citations

Optical Deep Ultraviolet, Short Wavelength Optic, Optical Materials +15

Resist degradation under plasma exposure: Synergistic effects of ion bombardment

O. Joubert, C. Fiori, J.C. Oberlin et al. · Journal of Applied Physics · 1991 · 29 citations

Engineering, Glow Discharge, Resist Degradation +18

Etching of polymers by oxygen plasmas: Influence of viscoelastic properties

O. Joubert, Patrick J. Paniez, Jacques Pelletier et al. · Applied Physics Letters · 1991 · 27 citations

Novolac Polymer, Engineering, Plasma Processing +17

Ultraviolet induced transformation of polysiloxane films

O. Joubert, G. Hollinger, C. Fiori et al. · Journal of Applied Physics · 1991 · 26 citations

Optical Materials, Engineering, Chemistry +16