M. Schumacher - Concepedia

Author

M. Schumacher

Aixtron (Germany)

Also Known As

M Schumacher, M. Schumacher, Marcel Schumacher, Markus Schumacher

Publications

770

Citations

H-Index

Concepts

All Affiliations

Aixtron (Germany)RWTH Aachen University North Carolina State University Forschungszentrum Jülich Centre National de la Recherche Scientifique

About

M. Schumacher is an author at Aixtron (Germany) specializing in applied physics, engineering, and thin films.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	578
2	Applied Physics	10	10	578
3	Natural Sciences	1	1	50
4	Chemical Engineering	1	1	19
5	Chemistry	1	1	19

M. Schumacher

Publications

700

Citations

H-Index

Page 1

	Year	Citations
Leakage currents in Ba0.7Sr0.3TiO3 thin films for ultrahigh-density dynamic random access memories G. Dietz, M. Schumacher, Rainer Waser, Journal of Applied Physics Non-volatile MemoryEngineeringChemical DepositionBa0.7sr0.3tio3 Thin FilmsSuperconductivity	1997	339
Mesoscale circulations over complex terrain in the Valencia coastal region, Spain – Part 2: Modeling CO <sub>2</sub> transport using idealized surface fluxes G. Pérez-Landa, Philippe Ciais, Gotzon Gangoiti, Atmospheric chemistry and physics	2007	72
AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin‐Film Processing M. Schumacher, P. K. Baumann, T. E. Seidel Chemical Vapor Deposition Complementary Technology SolutionsEngineeringThin Film Process TechnologyChemical DepositionNext Generation Dielectric	2006	51
Curie - Von Schweidler behaviour observed in ferroelectric thin films and comparison to superparaelectric thin film materials M. Schumacher, Rainer Waser Integrated ferroelectrics Relaxation ProcessThin Film PhysicsEngineeringAbstract Dielectric RelaxationFerroelectric Thin Films	1998	50
Dielectric relaxation of perovskite—type oxide thin films M. Schumacher, G. Dietz, Rainer Waser Integrated ferroelectrics Materials ScienceDevice ModelingElectrical EngineeringDielectric ResponsesEngineering	1995	41
Oxygen isotopic signature of CO <sub>2</sub> from combustion processes M. Schumacher, Roland A. Werner, Harro A. J. Meijer, Atmospheric chemistry and physics	2011	40
BST thin films grown in a multiwafer MOCVD reactor Fotios Fitsilis, S. Regnery, P. Ehrhart, Journal of the European Ceramic Society Materials EngineeringEngineeringApplied PhysicsBst Thin FilmsThin Films	2001	19
Deposition of thin BST films in a multi-wafer planetary reactor P. Ehrhart, Fotios Fitsilis, S. Regnery, Integrated ferroelectrics Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSurface Science	2000	19
Study of platinum thin films deposited by MOCVD as electrodes for oxide applications Oliver Valet, P. Doppelt, P. K. Baumann, Microelectronic Engineering Materials ScienceEngineeringSurface ElectrochemistryOxide ElectronicsSurface Science	2002	18
(Ba,Sr)TiO3 thin film growth in a batch processing MOCVD reactor S. Regnery, P. Ehrhart, Fotios Fitsilis, Journal of the European Ceramic Society Materials EngineeringMaterials ScienceEngineeringOxide ElectronicsApplied Physics	2003	15

Page 1