Publication | Closed Access
Curie - Von Schweidler behaviour observed in ferroelectric thin films and comparison to superparaelectric thin film materials
50
Citations
20
References
1998
Year
Relaxation ProcessThin Film PhysicsEngineeringAbstract Dielectric RelaxationFerroelectric Thin FilmsFerroelectric ApplicationMaterial PhysicThin Film ProcessingMaterials ScienceMaterials EngineeringPhysicsVon Schweidler BehaviourThin Film MaterialsElectrical PropertyFerroelasticsMaterial AnalysisNatural SciencesRelaxation PhenomenaApplied PhysicsCondensed Matter PhysicsFerroelectric MaterialsDielectric Thin FilmsThin FilmsFunctional MaterialsElectrical Insulation
Abstract Dielectric relaxation has been observed for a wide variety of materials. Specifically for dielectric thin films, a typical Curie - von Schweidler relaxation has been reported by many groups in the literature. Although some possible reasons for these relaxation phenomena have been discussed, a comprehensive understanding of the physical origins for all of these materials has not be obtained. Summarizing, not only our results, we present a physical model, which consistently explains the origin of the Curie-von Schweidler behavior for the wide variety of investigated thin film materials.
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