D.H. Zhang

Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD

D.H. Zhang, Yongsheng Gao, Jun Wei et al. · Thin Solid Films · 2000 · 67 citations

Natural Sciences, Materials Engineering, Materials Science +14

A new method for deposition of cubic Ta diffusion barrier for Cu metallization

Zifeng Yuan, D.H. Zhang, C.Y. Li et al. · Thin Solid Films · 2003 · 47 citations

Natural Sciences, Materials Engineering, Materials Science +15

Comparative study of Ta, TaN and Ta/TaN bi-layer barriers for Cu-ultra low-k porous polymer integration

Liping Yang, D.H. Zhang, C.Y. Li et al. · Thin Solid Films · 2004 · 46 citations

Natural Sciences, Materials Engineering, Materials Science +8

Study of copper diffusion into Ta and TaN barrier materials for MOS devices

S. W. LOH, D.H. Zhang, C.Y. Li et al. · Thin Solid Films · 2004 · 35 citations

Engineering, Materials Engineering, Materials Science +16

Characterization of beryllium-doped molecular beam epitaxial grown GaAs by photoluminescence

D.H. Zhang, K. Radhakrishnan, Soon Fatt Yoon · Journal of Crystal Growth · 1995 · 35 citations

Engineering, Electrical Engineering, Materials Science +12