Concepedia

Ta‐Hsun Yeh

TY

4

Publications

123

Citations

4

H-Index

1996

Active since

Affiliations

National Yang Ming Chiao Tung University(Current)

Institute of Electronics

Ta‐Hsun Yeh is an author at National Yang Ming Chiao Tung University specializing in applied physics, engineering, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial ScienceMaterials EngineeringThin FilmsMicrostructureNanoelectronicsMicroelectronicsElectrical Engineering

Publications per year

1996–1998

4

Publications

4

Amorphouslike chemical vapor deposited tungsten diffusion barrier for copper metallization and effects of nitrogen addition

Kow-Ming Chang, Ta‐Hsun Yeh, I‐Chung Deng et al. · Journal of Applied Physics · 1997 · 54 citations

Engineering, Chemical Deposition, Semiconductors +21

Nitridation of fine grain chemical vapor deposited tungsten film as diffusion barrier for aluminum metallization

Kow-Ming Chang, Ta‐Hsun Yeh, I‐Chung Deng · Journal of Applied Physics · 1997 · 30 citations

Aluminium Nitride, Engineering, Vacuum Device +16

Highly selective etching for polysilicon and etch-induced damage to gate oxide with halogen-bearing electron-cyclotron-resonance plasma

Kow-Ming Chang, Ta‐Hsun Yeh, I‐Chung Deng et al. · Journal of Applied Physics · 1996 · 28 citations

Materials Science, Materials Engineering, Electrical Engineering +13

The relaxation phenomena of positive charges in thin gate oxide during Fowler-Nordheim tunneling stress

Kow-Ming Chang, Chii-Horng Li, Shih‐Wei Wang et al. · IEEE Transactions on Electron Devices · 1998 · 11 citations

Electrical Engineering, Positive Charges, Engineering +15

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