Kyoungsub Shin

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

S. Banna, Ankur Agarwal, K. Tokashiki et al. · IEEE Transactions on Plasma Science · 2009 · 95 citations

Engineering, Plasma Physics, Plasma Processing +17

Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology

K. Tokashiki, Hong Cho, S. Banna et al. · Japanese Journal of Applied Physics · 2009 · 33 citations

Langmuir Probe, Electrical Engineering, Engineering +12

Dual stress capping layer enhancement study for hybrid orientation finFET CMOS technology

Kyoungsub Shin, Chi On Chui, Tsu‐Jae King · 2006 · 27 citations

Device Modeling, Electrical Engineering, Physical Design (Electronics) +15

The gate misalignment effects of the sub-threshold characteristics of sub-100 nm DG-MOSFETs

Hiu Yung Wong, Kyoungsub Shin, Mansun Chan · 2002 · 21 citations

Device Modeling, Electrical Engineering, Engineering +14

Resolving critical dimension drift over time in plasma etching through virtual metrology based wafer-to-wafer control

Ho Ki Lee, Kye Hyun Baek, Kyoungsub Shin · Japanese Journal of Applied Physics · 2017 · 17 citations

Electrical Engineering, Wafer Scale Processing, Engineering +15