Statistics
Publications
1
Citations
10
H-Index
1
Active since
1996
Affiliations
University of Wisconsin–Madison(Current)
Carla M. Nelson is an author at University of Wisconsin–Madison specializing in film processing effects, x-ray lithography, and thin-film materials.
Publications per year
1996–1996
1
1
Resist application effects on chemically amplified resist response
Paul M. Dentinger, Carla M. Nelson, Steven J. Rhyner et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 10 citations
Natural Sciences, Materials Engineering, Materials Science +13
1–1 of 1