Concepedia

Benjamin S. Lin

BS

3

Publications

47

Citations

3

H-Index

2005

Active since

Affiliations

Luminex (United States)(Current)

United Microelectronics (Taiwan)

Xilinx (United States)

Benjamin S. Lin is an author at Luminex (United States) specializing in technology, microelectronics, and engineering.

Top concepts

Publications per year

2005–2008

3

Publications

3

Inverse lithography technology at chip scale

Benjamin S. Lin, Ming Feng Shieh, Jie-wei Sun et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 19 citations

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Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning

Ming-Chien Chiu, Benjamin S. Lin, M. F. Tsai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 15 citations

Real-world impact of inverse lithography technology

Jonathan Ho, Yan Wang, Xin Wu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 13 citations

, , +14

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