N. Hayashi

Acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresist

Leipzig Schlegel, Takashi Ueno, Hiroshi Shiraishi et al. · Chemistry of Materials · 1990 · 38 citations

Engineering, Chemical Analysis, Acid Formation +16

Determination of Acid Diffusion in Chemical Amplification Positive Deep-UV Resists

Leo Schlegel, Takumi Ueno, N. Hayashi et al. · Japanese Journal of Applied Physics · 1991 · 30 citations

Diffusion Range, Chemical Engineering, Engineering +13

Acid-Catalyzed Reactions of Tetrahydropyranyl-Protected Polyvinylphenol in a Novolak-Resin-Based Positive Resist

Toshio Sakamizu, Hiroshi Shiraishi, Hidenori Yamaguchi et al. · Japanese Journal of Applied Physics · 1992 · 18 citations

Organic Material Chemistry, Chemical Engineering, Engineering +14

Alkali‐Developable Silicon Containing Positive Photoresist (ASTRO) for a Two‐Layer Resist System: Preparation and Processing

Mitsuhiro Toriumi, Hiroshi Shiraishi, Takashi Ueno et al. · Journal of The Electrochemical Society · 1987 · 17 citations

Materials Science, Two‐layer Resist System, Electronic Devices +15

A negative resist for KrF excimer laser lithography

Mitsuhiro Toriumi, N. Hayashi, Mana Hashimoto et al. · Polymer Engineering and Science · 1989 · 12 citations

Aromatic Azide, Engineering, Electron-beam Lithography +18