Concepedia

Sychyi Fang

SF

6

Publications

211

Citations

6

H-Index

1992

Active since

Affiliations

Stanford University(Current)

Stanford SystemX Alliance

Nippon Steel (Japan)

Sychyi Fang is an author at Stanford University specializing in microelectronics, applied physics, and electrical engineering.

Top concepts

EngineeringApplied PhysicsMicroelectronicsElectrical EngineeringElectrical InsulationSurface SciencePhysicsElectronic PackagingNanoelectronicsMicrofabrication

Publications per year

1992–1994

6

Publications

6

Charging damage to gate oxides in an O2 magnetron plasma

Sychyi Fang, J.P. McVittie · Journal of Applied Physics · 1992 · 70 citations

Sheath Model, Electrical Engineering, Engineering +14

Oxide damage from plasma charging: breakdown mechanism and oxide quality

Sychyi Fang, J.P. McVittie · IEEE Transactions on Electron Devices · 1994 · 37 citations

Electrical Engineering, Oxide Quality, Plasma Exposure +15

Model for oxide damage from gate charging during magnetron etching

Sychyi Fang, J.P. McVittie · Applied Physics Letters · 1993 · 31 citations

Engineering, Oxide Damage, Semiconductor Device +16

Ion trajectory distortion and profile tilt by surface charging in plasma etching

Shigemi Murakawa, Sychyi Fang, J.P. McVittie · Applied Physics Letters · 1994 · 30 citations

Electrical Engineering, Plasma Electronics, Engineering +15

A new model for thin oxide degradation from wafer charging in plasma etching

Sychyi Fang, Murakawa, McVittie · 1992 · 29 citations

Materials Science, Electrical Engineering, Plasma Electronics +15

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