Jonathan Cobb - Concepedia

Author

Jonathan Cobb

Motorola (United States)

Also Known As

Jonathan Cobb, Jonathan L. Cobb

Publications

407

Citations

H-Index

Concepts

All Affiliations

Motorola (United States)Sandia National Laboratories California Advanced Micro Devices (United States)IBM Research - Almaden Intel (United States)

About

Jonathan Cobb is an author at Motorola (United States) specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	276
2	Applied Physics	9	9	264
3	Medicine	1	1	21
4	Natural Sciences	1	1	40
5	Chemistry	1	1	40

Jonathan Cobb

Publications

286

Citations

H-Index

Page 1

	Year	Citations
Modulation of the charge of a single-electron transistor by distant defects Neil M. Zimmerman, Jonathan Cobb, A. F. Clark Physical review. B, Condensed matter Electrical EngineeringEngineeringTriggered TlfPhysicsTunneling Microscopy	1997	61
Current Status of EUV Photoresists Robert L. Brainard, Jonathan Cobb, Charlotte Cutler Journal of Photopolymer Science and Technology EngineeringElectron-beam LithographyEuv ResistsResistorBeam Lithography	2003	42
Extendibility of chemically amplified resists: another brick wall? William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyImage CaResistor	2003	40
Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation Robert L. Brainard, Craig C. Henderson, Jonathan Cobb, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyChemistry	1999	40
Sub-100-nm lithographic imaging with an EUV 10X microstepper J. E. M. Goldsmith, Kurt W. Berger, Dan R. Bozman, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical EngineeringEngineeringElectron-beam LithographyMicroscopySpace Optic	1999	21
Ultrathin photoresists for EUV lithography Veena Rao, Jonathan Cobb, Craig C. Henderson, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyEuv RadiationMicroscopyThin Layer Imaging	1999	19
Modeling the impact of photoresist trim etch process on photoresist surface roughness Shahid Rauf, Phillip J. Stout, Jonathan Cobb Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Photoresist Surface RoughnessEngineeringElectron-beam LithographyContact MechanicMechanical Engineering	2003	15
Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection Sang-In Han, James R. Wasson, Pawitter J. S. Mangat, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptical Testing	2002	14
Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets Scott D. Hector, Sergei V. Postnikov, Jonathan Cobb Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyIndustrial EngineeringCd ControlIndustrial Control System	2004	12
Rigorous EUV mask simulator using 2D and 3D waveguide methods Zhengrong Zhu, Kevin Lucas, Jonathan Cobb, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE AeroacousticsOptical MaterialsEngineeringMultilayer StackPhysics	2003	12

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