Jonathan Cobb

Modulation of the charge of a single-electron transistor by distant defects

Neil M. Zimmerman, Jonathan Cobb, A. F. Clark · Physical review. B, Condensed matter · 1997 · 61 citations

Electrical Engineering, Engineering, Triggered Tlf +14

Current Status of EUV Photoresists

Robert L. Brainard, Jonathan Cobb, Charlotte Cutler · Journal of Photopolymer Science and Technology · 2003 · 42 citations · Full text

Engineering, Electron-beam Lithography, Euv Resists +17

Extendibility of chemically amplified resists: another brick wall?

William D. Hinsberg, Frances A. Houle, Martha I. Sanchez et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 40 citations

Engineering, Electron-beam Lithography, Microscopy +20

Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation

Robert L. Brainard, Craig C. Henderson, Jonathan Cobb et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 40 citations

Short Wavelength Optic, Optical Materials, Engineering +24

Sub-100-nm lithographic imaging with an EUV 10X microstepper

J. E. M. Goldsmith, Kurt W. Berger, Dan R. Bozman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 21 citations

Optical Engineering, Engineering, Electron-beam Lithography +19