Georgia K. Rich

Collapse behavior of single layer 193- and 157-nm resists: use of surfactants in the rinse to realize the sub-130-nm nodes

Stefan Hien, Georgia K. Rich, Gilbert Molina et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 24 citations

Engineering, Electron-beam Lithography, Mechanical Engineering +23

Pattern collapse in high-aspect-ratio DUV and 193-nm resists

Wolf‐Dieter Domke, Victoria L. Graffenberg, Shashikant Patel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 16 citations

Engineering, Mechanical Engineering, Semiconductor Device +16

Novel high-index resists for 193-nm immersion lithography and beyond

Idriss Blakey, Lan Chen, Bronwin Dargaville et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 15 citations

Optical Materials, Engineering, Electron-beam Lithography +22

Photoresist outgassing at 157 nm exposure

Stefan Hien, Steve Angood, Dominic Ashworth et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 14 citations

Optical Materials, Engineering, Laser Ablation +17

Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms

Thomas I. Wallow, Phillip J. Brock, Richard A. Di Pietro et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Materials Science, Chemical Engineering, Engineering +13