Richard A. Di Pietro

Limits to etch resistance for 193-nm single-layer resists

Roderick R. Kunz, S. C. Palmateer, Anthony R. Forte et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 74 citations

Engineering, Responsive Polymers, 193-Nm Transparent Polymers +23

<title>193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system</title>

Robert D. Allen, Gregory M. Wallraff, Richard A. Di Pietro et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 28 citations

Optical Materials, Engineering, Electron-beam Lithography +22

Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

Will Conley, Gregory Breyta, William R. Brunsvold et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 21 citations

Optical Materials, Engineering, Electron-beam Lithography +17

Protecting groups for 193-nm photoresists

Robert D. Allen, Ratnam Sooriyakumaran, Juliann Opitz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 20 citations

Materials Science, Photonics, Chemical Engineering +13

Nitrogen-15 solid-state NMR studies on the cure and degradation of polyimide films under temperature and humidity stress

P.D. Murphy, Richard A. Di Pietro, Craig Lund et al. · Macromolecules · 1994 · 16 citations

Macromolecular Chemistry, Engineering, Altmetric Attention Score +20