S. A. Moshkalyov

Carbon nanotubes growth by chemical vapor deposition using thin film nickel catalyst

S. A. Moshkalyov, A. L. D. Moreau, H.R. Guttiérrez et al. · Materials Science and Engineering B · 2004 · 65 citations

Materials Science, Engineering, Carbon-based Material +7

Role of low-energy electrons in Ar emission from low-pressure radio frequency discharge plasma

S. A. Moshkalyov, P. G. Steen, Sergi Gomez et al. · Applied Physics Letters · 1999 · 33 citations

Engineering, Plasma Science, Plasma Physics +16

Deposition of silicon nitride by low-pressure electron cyclotron resonance plasma enhanced chemical vapor deposition in N2/Ar/SiH4

S. A. Moshkalyov, J. A. Diniz, Jacobus W. Swart et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 28 citations

Engineering, Glow Discharge, Plasma Physics +22

Silicon nitride etching in high- and low-density plasmas using SF6/O2/N2 mixtures

C. Reyes‐Betanzo, S. A. Moshkalyov, Jacobus W. Swart et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 25 citations · Full text

Engineering, Silicon On Insulator, Plasma Processing +17

Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectors

S. A. Moshkalyov, C. Thompson, T. Morrow et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 16 citations

Engineering, Glow Discharge, Rf Discharge Plasma +17