Russell M. Hudyma

EUV optical design for a 100-nm CD imaging system

Donald W. Sweeney, Russell M. Hudyma, Henry N. Chapman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 61 citations · Full text

Natural Sciences, Manufacturing Engineering, Optical Materials +13

Fabrication and testing of optics for EUV projection lithography

John S. Taylor, Gary E. Sommargren, Donald W. Sweeney et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 45 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +8

High-resolution EUV imaging tools for resist exposure and aerial image monitoring

Martin J. Booth, O. Brisco, Adam N. Brunton et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 37 citations

Engineering, Mechanical Engineering, Digital Imaging +9

Sub-diffraction-limited multilayer coatings for the 03 numerical aperture micro-exposure tool for extreme ultraviolet lithography

Régina Soufli, Russell M. Hudyma, Eberhard Spiller et al. · Applied Optics · 2007 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +15

<title>EUV engineering test stand</title>

Daniel A. Tichenor, Glenn D. Kubiak, William C. Replogle et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 34 citations · Full text

Engineering, Physics, Instrumentation +8