Tadashi Serikawa - Concepedia

Author

Tadashi Serikawa

Semiconductor Energy Laboratory (Japan)

Also Known As

Serikawa, Tadashi, Tadashi SERIKAWA, Tadashi Serikawa, Tadashi Serikawa Tadashi Serikawa

Publications

504

Citations

H-Index

Concepts

All Affiliations

Semiconductor Energy Laboratory (Japan)NTT (Japan)

About

Tadashi Serikawa is an author at Semiconductor Energy Laboratory (Japan) specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	11	372
2	Applied Physics	10	10	322
3	Electrical Engineering	8	8	300
4	Materials Science	8	8	250
5	Physics	2	2	61

Tadashi Serikawa

Publications

372

Citations

H-Index

Page 1

	Year	Citations
Electrical Characteristics of High-Mobility Fine-Grain Poly-Si TFTs from Laser Irradiated Sputter-Deposited Si Film Tadashi Serikawa, Seiiti Shirai, Akio Okamoto, Japanese Journal of Applied Physics Small Grain SizeEngineeringIntegrated CircuitsThin Film Process TechnologySilicon On Insulator	1989	68
4.0-inch Active-Matrix Organic Light-Emitting Diode Display Integrated with Driver Circuits Using Amorphous In–Ga–Zn-Oxide Thin-Film Transistors with Suppressed Variation Hiroki Ohara, Toshinari Sasaki, Kousei Noda, Japanese Journal of Applied Physics EngineeringOrganic ElectronicsOptoelectronic DevicesIntegrated CircuitsSemiconductor Device	2010	58
21.3: 4.0 In. QVGA AMOLED Display Using In‐Ga‐Zn‐Oxide TFTs with a Novel Passivation Layer Hiroki Ohara, Toshinari Sasaki, Kousei Noda, SID Symposium Digest of Technical Papers Wide-bandgap SemiconductorSemiconductor TechnologyElectrical EngineeringNovel Passivation LayerEngineering	2009	54
15.2: Development of Driver‐Integrated Panel Using Amorphous In‐Ga‐Zn‐Oxide TFT Takeshi Osada, Kengo Akimoto, Takehisa Sato, SID Symposium Digest of Technical Papers Materials ScienceElectrical EngineeringGate DriverEngineeringDisplay Technology	2009	50
X-ray generation enhancement from a laser-produced plasma with a porous silicon target Tadashi Nishikawa, Hidetoshi Nakano, Hyeyoung Ahn, Applied Physics Letters EngineeringPorous Si TargetLaser-plasma InteractionLaser ApplicationsLaser Plasma Physic	1997	50
Development of Liquid Crystal Display Panel Integrated with Drivers Using Amorphous In–Ga–Zn-Oxide Thin Film Transistors Takeshi Osada, Kengo Akimoto, Takehisa Sato, Japanese Journal of Applied Physics Materials ScienceSemiconductor TechnologyElectrical EngineeringElectronic DevicesGate Driver	2010	32
High-Mobility Poly-Si Thin Film Transistors Fabricated on Stainless-Steel Foils by Low-Temperature Processes Using Sputter-Depositions Tadashi Serikawa, Fujio Omata Japanese Journal of Applied Physics Si FilmsEngineeringActive SiIntegrated CircuitsThin Film Process Technology	2000	15
Magnetron‐Sputtered Silicon Films for Gate Electrodes in MOS Devices Akio Okamoto, Tadashi Serikawa Journal of The Electrochemical Society Thin Film PhysicsEngineeringThin Film Process TechnologySemiconductor DeviceSemiconductors	1987	13
Transport Properties in Band-Tails of High Mobility Poly-Si TFTs Tadashi Serikawa, Seiiti Shirai, Kazuo Nakagawa, Japanese Journal of Applied Physics Materials ScienceSemiconductorsSemiconductor TechnologyEngineeringElectronic Materials	1996	11
Deposition Characteristics and Properties of SiO<sub>2</sub> Films Prepared by Reactive Sputtering in Hydrogen-, Oxygen- and Nitrogen-Argon Mixtures Tadashi Serikawa, Seiiti Shirai Japanese Journal of Applied Physics EngineeringThin Film Process TechnologyChemical DepositionSilicon On InsulatorNanoelectronics	1994	11

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