X-ray generation enhancement from a laser-produced plasma with a porous silicon target

Abstract

X-ray generation enhancement from a laser-produced plasma with a porous Si target is reported. For a porous surface formed on a Si wafer, the self-reflectivity of a femtosecond pulse becomes considerably small. The observed energy penetration depth is 25–30 μm, which is much larger than the skin depth of solid density matter. Using a porous Si target, the threshold of the pre-pulse intensity required for soft x-ray emission enhancement can be reduced. It also contributes to enhance the pre-pulse effect, and soft x-ray generation enhancement ranging from 1.6 to 6.5 times is observed depending on the pre-pulse intensity.