J. Casey - Concepedia

Author

J. Casey

Massachusetts Institute of Technology

Also Known As

J. Casey, J. D. Casey, J. David Casey, J. David Casey, Jr., J.D. Casey, J.David Casey, Julie Casey

Publications

423

Citations

H-Index

Concepts

All Affiliations

Massachusetts Institute of Technology Fibics (Canada)Fusion Academy Plasma Technology (United States)

About

J. Casey is an author at Massachusetts Institute of Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	12	361
2	Applied Physics	8	8	247
3	Natural Sciences	2	2	84
4	Chemical Engineering	1	1	30
5	Chemistry	1	1	27

J. Casey

Publications

377

Citations

H-Index

Page 1

	Year	Citations
Plasma production and heating in a tandem mirror central cell by radio-frequency waves in the ion cyclotron frequency range S. N. Golovato, K. Brau, J. Casey, The Physics of Fluids Plasma ProductionIcrf CouplingEngineeringNuclear PhysicsPhysics	1988	57
MOCVD growth of thick AlN and AlGaN superlattice structures on Si substrates M. A. Mastro, Charles R. Eddy, D. Kurt Gaskill, Journal of Crystal Growth Materials EngineeringMaterials ScienceAluminium NitrideWide-bandgap SemiconductorAlgan Superlattice Structures	2005	48
Laser-induced vapour-phase syntheses of boron and titanium diboride powders J. Casey, J. S. Haggerty Journal of Materials Science Materials EngineeringMaterials ScienceBoron NitrideEngineeringLaser-induced Vapour-phase Syntheses	1987	46
Gas-assisted etching with focused ion beam technology J. Casey, Andrew F. Doyle, Randall G. Lee, Microelectronic Engineering EngineeringBeam LithographyMicrofabricationSurface ScienceApplied Physics	1994	44
Laser-induced vapour-phase synthesis of titanium dioxide J. Casey, J. S. Haggerty Journal of Materials Science Materials ScienceChemical EngineeringEngineeringLaser PhotochemistryLaser-induced Vapour-phase Synthesis	1987	30
Copper device editing: Strategy for focused ion beam milling of copper J. Casey, Michael W. Phaneuf, Clive Chandler, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Copper Device EditingEngineeringElectron-beam LithographyIon ImplantationMaterial Processing	2002	30
One-point numerical modeling of microwave plasma chemical vapor deposition diamond deposition reactors E. Hyman, K. Tsang, A. Drobot, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringReactor PhysicsComputational ChemistryChemistryPlasma Processing	1994	27
Stability of plasmas sustained by ion cyclotron wave excitation in the central cell of the Tara tandem mirror S. N. Golovato, K. Brau, J. Casey, Physics of Fluids B Plasma Physics Macroscopic StabilityIon CyclotronEngineeringPhysicsPlasma Theory	1989	22
Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair Diane K. Stewart, Andrew F. Doyle, J. Casey Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringX-ray MasksFib Dielectric FilmsTantalum FilmsVacuum Device	1995	16
Gallium Phase Formation in Cu and Other FCC Metals During Near-Normal Incidence Ga-FIB Milling and Techniques to Avoid this Phenomenon M. W. Phaneuf, J Li, J. Casey Microscopy and Microanalysis	2002	16

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