Seung-Jin Yeom

Modified atomic layer deposition of RuO2 thin films for capacitor electrodes

Jin-Hyock Kim, Deok-Sin Kil, Seung-Jin Yeom et al. · Applied Physics Letters · 2007 · 51 citations

Engineering, Thin Film Process Technology, Chemistry +16

Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)₂] and Dicobalt Octacarbonyl [Co₂(CO)₈]

Keunjun Kim, Keun‐Woo Lee, Sejin Han et al. · Japanese Journal of Applied Physics · 2007 · 36 citations

Materials Science, Chemical Engineering, Carbonization +11

Effect of nitrogen incorporation on improvement of leakage properties in high-k HfO2 capacitors treated by N2-plasma

Nak-Jin Seong, Soon‐Gil Yoon, Seung-Jin Yeom et al. · Applied Physics Letters · 2005 · 27 citations

Materials Science, Electrical Engineering, Chemical Engineering +13

Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl

Keun‐Woo Lee, Keunjun Kim, Tae-Yong Park et al. · Journal of The Electrochemical Society · 2007 · 27 citations

Engineering, Ti-capped Co Films, Impurity Contents +16

Gate-first high-k/metal gate DRAM technology for low power and high performance products

Minchul Sung, Se‐Aug Jang, Hyunjin Lee et al. · 2015 · 27 citations

Low-power Electronics, Low Power, Electrical Engineering +14