Robert C. Keller - Concepedia

Author

Robert C. Keller

Fraunhofer Institute for Applied Solid State Physics

Also Known As

R. C. Keller, R. Keller, R.C. Keller, Robert C. Keller, Robert Keller

Publications

663

Citations

H-Index

Concepts

All Affiliations

Fraunhofer Institute for Applied Solid State Physics Alcatel Lucent (Germany)Texas Instruments (United States)Nokia (United States)Fraunhofer-Gesellschaft

About

Robert C. Keller is an author at Fraunhofer Institute for Applied Solid State Physics specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	19	593
2	Applied Physics	11	11	369
3	Chemistry	4	4	124
4	Chemical Engineering	3	3	87
5	Health Sciences	1	1	13

Robert C. Keller

Publications

603

Citations

H-Index

Page 1

	Year	Citations
NBTI enhancement by nitrogen incorporation into ultrathin gate oxide for 0.10-μm gate CMOS generation N. Kimizuka, Keiko Yamaguchi, K. Imai, EngineeringUltrathin Gate OxideNitrogen IncorporationSemiconductor DeviceNanoelectronics	2002	139
Wavelength-selective 1×4 switch for 128 WDM channels at 50 GHz spacing Dan M. Marom, David T. Neilson, Dennis S. Greywall, EngineeringWdm ChannelsProgrammable PhotonicsOptical PropertiesOptical Switching	2003	57
Peroxide Curing of Ethylene-Propylene Elastomers Robert C. Keller Rubber Chemistry and Technology Materials SciencePolymer MaterialEngineeringPolymer TechnologyMechanical Properties	1988	46
Gate quality doped high K films for CMOS beyond 100 nm: 3-10 nm Al/sub 2/O/sub 3/ with low leakage and low interface states L. Manchanda, W.H. Lee, J. E. Bower, Materials ScienceGate QualityElectrical EngineeringSilicon/aluminum Oxide InterfaceEngineering	2002	42
Dry etching of Hg1−xCdxTe using CH4/H2/Ar/N2 electron cyclotron resonance plasmas Robert C. Keller, M. Seelmann‐Eggebert, H. J. Richter Journal of Electronic Materials Materials SciencePlasma ElectronicsEngineeringElectron-beam LithographySurface Science	1996	37
Reaction chemistry and resulting surface structure of HgCdTe etched in CH4/H2 and H2 ECR plasmas Robert C. Keller, M. Seelmann‐Eggebert, H. J. Richter Journal of Electronic Materials Materials ScienceReaction ChemistryChemical EngineeringSurface StructureEngineering	1995	33
Addition of N2 as a polymer deposition inhibitor in CH4/H2 electrocyclotron resonance plasma etching of Hg1−<i>x</i>Cd<i>x</i>Te Robert C. Keller, M. Seelmann‐Eggebert, H. J. Richter Applied Physics Letters EngineeringElectron-beam LithographyChemistryAtomic NitrogenPolymer Deposition Inhibitor	1995	29
MEMS thermal imager with optical readout Chris Jones, Cristian Bolle, Roland Ryf, Sensors and Actuators A Physical EngineeringApplied PhysicsThermal ImagingOptical ReadoutInstrumentation	2009	27
A 14-bit 8.9GS/s RF DAC in 40nm CMOS achieving >71dBc LTE ACPR at 2.9GHz Vishnu Ravinuthula, W. Bright, Mark Weaver, Electrical EngineeringSynthesized Digital BlockEngineeringMixed-signal Integrated CircuitAnalog Design	2016	26
Growth of Sn thin films on CdTe(111) Heiko Zimmermann, Robert C. Keller, P. Meisen, Surface Science Materials EngineeringMaterials ScienceIi-vi SemiconductorEngineeringNanotechnology	1997	25

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