Publication | Closed Access
Dry etching of Hg1−xCdxTe using CH4/H2/Ar/N2 electron cyclotron resonance plasmas
37
Citations
23
References
1996
Year
Materials SciencePlasma ElectronicsEngineeringElectron-beam LithographySurface ScienceDry EtchingApplied PhysicsChemistryPlasma ApplicationPlasma Etching
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